Main Task

2026

- Development of Non-E/T-Type Dedicated Stripper for Masking Processes
- Relocation to the New Yongin Central Research Center

2025

- Development of Non-E/T-Type Chemical Bonding Technology
- Development of PR Cleaner

2024

- Development of Chlorate-Type Etching Additive NEA-01
- Development of Bacterial Cleaner
- Development of CZ Pre-Treatment Degreaser

2023

- Development of De0flux Cleaner
- Development of TGV Ti/Cu Etchant
- Development of PR Stripper

2022

- Development of Etching Additive NIE-30
- Development of Chemical Bonding Technology for Organic Film Coating

2021

- Development of Etching Additive NIE-20
- Development of Invar Mask Etchant

2020

- Designation as an ECRC Excellent Research Institute
- Development of Fine-Pitch SAP Etchant EFP-5
- Development of an Industrial Cleaner as an Alternative to DMC

2019

Development of additive-type developer cleaning agent
Development for desmear chemical

2018

Development of deflux cleaner 
Development of mold release agent
Applied for a patent for metal cleaner and metal cleaning method

2017

Development of eco-friendly metal cleaner

2016

Development of PSR organic acid etching solution
Development of metal cleaner

2015

Development of heavy resist stripping/developing solution
Development of low etching solution under 0.3 μm

2014

Development of Non-etching type stripping solution

2013

Development of OCA/OCR resin remover RV series
Development of high-performance degreasing solution

2012

Development of Equipment cleaner
Development of MSAP FE Series 

2011

Expansion of the 2nd technology research center
Patent application for etching solution and stripping solution

2010

Expansion of the 2nd production plant and the technical research center
Development of Amine-based stripping solution NRS Series

2008

Foundation of the research center

2007

Development of Ni, Sn, Ai etchant 
Development of etchant additive for high density wiring
Acquired ISO 14001

2006

Development of Semi Additive Process Etching Solution
Acquired ISO 9001

2004

Development of Half Etching Solution

2003

Development of stripping solution for fine pattern

2002

Development of high-performance equipment cleaner

2000

Development of Antifoamer for PCB

1998

Localization of Pretreatment Chemical for PCB